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    Enhanced mechanical properties of low-surface energy thin films by simultaneous plasma polymerization of fluorine and epoxy containing polymers
    (ELSEVIER SCIENCE BV, 2016) Karaman, Mustafa; Ucar, Tuba
    Thin films of poly(2,2,3,4,4,4 hexafluorobutyl acrylate-glycidyl methacrylate) (P(HFBA-GMA) were deposited on different surfaces using an inductively coupled RF plasma reactor. Fluorinated polymer was used to impart hydrophobicity, whereas epoxy polymer was used for improved durability. The deposition at a low plasma power and temperature was suitable for the functionalization of fragile surfaces such as textile fabrics. The coated rough textile surfaces were found to be superhydrophobic with water contact angles greater than 150 due to the high retention of long fluorinated side chains. The hydrophobicity of the surfaces was observed to be stable after many exposures to ultrasonification tests, which is attributed to the mechanical durability of the films due to their epoxide functionality. FTIR and XPS analyses of the deposited films confirmed that the epoxide functionality of the polymers increased with increasing glycidyl methacrylate fraction in the reactor inlet. The modulus and hardness values of the films also increase with increasing epoxide functionality. (C) 2015 Elsevier B.V. All rights reserved.
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    INITIATED PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (i-PECVD) OF POLY(ALKYL ACRYLATES)
    (IEEE, 2015) Karaman, Mustafa; Gursoy, Mehmet; Ucar, Tuba; Demir, Emrah; Yenice, Ezgi
    [Abstract not Available]
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    Initiation of 2-Hydroxyethyl Methacrylate Polymerization by Tert-Butyl Peroxide in a Planar PECVD System
    (WILEY-V C H VERLAG GMBH, 2016) Gursoy, Mehmet; Ucar, Tuba; Tosun, Zahide; Karaman, Mustafa
    This article reports on the deposition conditions and characterization of poly(2-hydroxyethyl methacrylate) thin films grown by initiated plasma enhanced chemical vapor deposition process. The plasma power is inductively coupled into the process chamber with a planar-coil antenna through a quartz window, and the substrate is cooled to promote physical adsorption of monomers on its surface. The introduction of the initiator allowed for film deposition at very low plasma powers (1W) and greatly improves the deposition rates. Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS) analyses confirmed that the chemical functionalities of the monomers are preserved to a good extent during the depositions that were carried out at low plasma powers. The deposition kinetics of PECVD-produced films from HEMA can be tailored by varying the substrate temperature. The apparent activation energies observed from PHEMA deposition kinetics with varying substrate temperatures are observed to be negative, which supports the hypothesis of the free radical polymerization mechanism in the PECVD PHEMA deposition.